ITO-PET conductive film

At the end of the 19th century, very thin metal films were obtained on photoconductive materials. The research on transparent conductive materials entered a new era, or it should be said, during the Second World War, primarily applied to the de-icing windows of aircraft. In 1950, the second transparent semiconductor oxide, In2O3, was first produced, especially after tin doping in In2O3, making this material widely used in transparent conductive thin films and having broad application prospects.

The basic properties of ITO (In2O3:SnO2=9:1) thin films are associated with the microstructure of ITO. After doping Sn into In2O3, Sn atoms can replace In atoms in the In2O3 lattice and exist in the form of SnO2. Since In atoms in In2O3 are trivalent, contributing an electron to the conduction band during the formation of SnO2, and simultaneously generating oxygen holes under certain oxygen-deficient conditions, ITO thin films exhibit carrier concentrations in the range of 10^20 to 10^21 cm^-3 and mobility in the range of 10 to 30 cm^2/Vs.

This mechanism leads to low thin film resistivity in the order of 10^-4 Ω.cm, giving ITO thin films semiconductor-like conductivity. ITO is a wide bandgap thin film material with a bandgap of 3.5-4.3 eV. The exciton absorption threshold for ultraviolet light, producing a forbidden band, is at 3.75 eV, equivalent to a wavelength of 330 nm. Therefore, the ultraviolet light transmittance of ITO thin films is extremely low.

Simultaneously, in the near-infrared region, reflection occurs due to the plasma vibration phenomenon of carriers, resulting in low transmittance for near-infrared light. However, the visible light transmittance of ITO thin films is very good in the visible light region. Due to the specific physical and chemical properties of the material, ITO thin films exhibit excellent conductivity and high visible light transmittance.

Our ITO coating can achieve a maximum width of 220 centimeters and a length of 4300 meters, meeting your diverse product customization and cutting requirements. With the continuous advancement of our technology, new demands are placed on the performance characteristics of ITO films.

Simultaneously, the in-depth development of ITO film preparation technology makes it possible to meet the requirements of display devices. We offer ITO films with different performance characteristics that can find better applications in various display devices.

With the quiet rise of touch-input electronic products such as PDAs and e-books, corresponding equipment for the production of related materials has emerged. Due to the unique working principles of touch-input products, the required ITO films must be made on flexible materials (PET). The deposition temperature of the film cannot be too high (less than 120°C), and at the same time, it is required that the ITO film layer be thin, with high and uniform surface resistance. Therefore, various ITO films with different widths, colors, and performance parameters have been introduced to meet these specific requirements.